Identification of colloidal silica polishing induced contamination in silicon
نویسندگان
چکیده
منابع مشابه
Depth Profiling of Polishing-Induced Contamination on Fused Silica Surfaces
Laser-induced damage on optical surfaces is often associated with absorbing contaminants introduced by the polishing process. This is particularly the case for W optics. In the present study, secondmy ion mass spectroscopy (SIMS) was used to measure depth profiles of finishing-process contamination on fused silica surfaces. Contaminants detected include the major polishing compound components (...
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ژورنال
عنوان ژورنال: Materials Characterization
سال: 2019
ISSN: 1044-5803
DOI: 10.1016/j.matchar.2019.04.029